Function: | Storage Pressure Vessel |
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Application: | Gas |
Material: | Stainless Steel |
Pressure: | 10.0MPa≤p<100.0MPa |
Storage Medium: | Food Grade CO2 |
Pressure Level: | High Pressure (10.0MPa≤p<100.0MPa) |
Customization: |
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1.The application and specific details of gases | ||||
High purity helium(He) | ||||
Main application: used in the study of ultralow temperature, gas chromatography analysis, nonferrous metal welding, leak, chemical gas phase deposition, crystal growth, the configuration of the plasma dry, special mixture, used as a standard gas, gas balance,medical gas, inflatable balloon, tube, diving suits, etc. |
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The name of the gas | specifications | Impurity content(10-6) | standard number | |
He | 99.999% | Ne≤4 O2≤1.0 H2≤1 N2≤2 CO≤0.5 CO2≤0.5 CH4≤0.5 H2O≤3 | GB/T48443-1995 | |
99.995% | Ne≤15 O2≤3 H2≤3 N2≤10 CO≤1 CO2≤1 CH4≤1 H2O≤10 | GB/T48442-1995 | ||
Nitrous oxide (N2O) | ||||
Purpose: 1.The medicine: immune regulating blood pressure, nerve transmission, physiological regulation and physiological function such as inhibition of platelet aggregation 2.Petrochemical fields: in the field of petrochemical industry to develop new applications, used in polymerization reaction termination 3.Other areas: refrigerants, accelerant, preservatives, chemical raw materials, atomic absorption spectrometry using gas, semiconductor manufacturing with equilibrium gas injection agent, oxidation, standard gas and smoke, vacuum pressure leak detection cassette agent, etc |
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The name of the gas | specifications | Impurity content(10-6) | standard number | |
N2O | 99.9%/99.999% | CO≤5 CO2≤10 Halogen≤0.2 Moisture≤100 NO,NO2≤0.5 NH3≤5 | CP2005 & Q/H3901-1999 | |
High purity argon(Ar) | ||||
purpose: used for welding, stainless steel manufacturing, and smelting of nonferrous metals, also used in the semiconductor manufacturing process inchemical vapor deposition, crystal sound field, strong oxidation, extension, diffusion, polysilicon, tungsten, ion implantation, sintering, etc.Used as a standard gas, zero equilibrium gas, gas, gas chromatography carrier gas, etc |
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The name of the gas | specifications | Impurity content(10-6) | standard number | |
Ar | 99.9993% | N2≤4 O2≤1 H2≤1 THC≤1 H2O≤2.6 | GB/T4842-2006 | |
99.999% | N2≤5 O2≤2 H2≤1 THC≤2 H2O≤4 | |||
High purity carbon dioxide | (CO2) | |||
Purpose: laser, electronics industry, reactor coolant, scientific research, etc | ||||
The name of the gas | specifications | Impurity content(10-6) | standard number | |
CO2 | 99.99% | H2≤50 O2≤10 N2≤50 CO≤5 THC≤5 H2O≤15 | The enterprise standard | |
99.995% | H2≤20 O2≤5 N2≤30 CO≤2 THC≤3 H2O≤8 | |||
99.999% | H2≤5 O2≤1 N2≤3 CO≤0.5 THC≤2 H2O≤3 |
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